JEOL JBX 5500 FS E-Beam Direct Write Lithography system provides superior precision for maskless pattern generation. Engineered for fine-feature fabrication, it enables accurate exposure control and high repeatability. Ideal for R&D and manufacturing, the platform supports advanced lithography processes required in semiconductor, photonics, and nanoscale device fabrication environments. https://www.bridgetronic.com/products/147399